Manufacturing of Sputtering Composite Targets Containing Phases of Co2FeSi or Co2MnSi Heusler Alloy

The paper presents a method for manufacturing mechanically strong sputtering composite targets containing the phase of the Co 2 FeSi or Co 2 MnSi Heusler alloy of the stoichiometric composition, which can be used for fabrication of spin electronic devices by high-frequency magnetron deposition and p...

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Veröffentlicht in:	Technical physics 2018-07, Vol.63 (7), p.1002-1005
Hauptverfasser:	Demidov, E. S., Sdobnyakov, V. V., Vazenmiller, G. V., Chigirinskii, Yu. I., Dudin, Yu. A., Lesnikov, V. P., Trushin, V. N., Boldin, M. S., Belkin, O. A., Bobrov, A. A., Sakharov, N. V.
Format:	Artikel
Sprache:	eng
Schlagworte:	Classical and Continuum Physics Electron spin Electronic devices Heusler alloys Physical Science of Materials Physics Physics and Astronomy Pulsed laser deposition Sputtering Thin films
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Beschreibung
Zusammenfassung:	The paper presents a method for manufacturing mechanically strong sputtering composite targets containing the phase of the Co 2 FeSi or Co 2 MnSi Heusler alloy of the stoichiometric composition, which can be used for fabrication of spin electronic devices by high-frequency magnetron deposition and pulsed laser deposition of thin films.
ISSN:	1063-7842 1090-6525
DOI:	10.1134/S1063784218070095