Design and implementation of a photolithography system to fabricate microdevices from thin films

This article presents the design and implementation of a photolithography system to manufacture microdevices based on thin films. The system works with ultraviolet (UV) source of 380nm and allows to obtain 10-200 μm microstructures. The implementation was made with the product design and development process, where the technical specifications, generation, selection and proof of concepts of the system equipment modules were determined. A spincoater with an operating range of 500-6000 rpm and UV radiation source, based on LEDs, with ranges in power of 1-20mW/cm2 and time of exposure 1-60s, were implemented. With optical microscopy and digital image processing, it was determined that the percentage relative error in their areas is less than 4% and the variability in their widths is less than two times the standard deviation.