Surface effect of n-GaAs cap on the THz emission in LT-GaAs
The deposition of n-GaAs cap on low-temperature GaAs (LT-GaAs) improved the THz emission of LT-GaAs grown at a much lower temperature (< 300 ∘ C), where the defect density is high, without compromising the spectral bandwidth and carrier lifetimes necessary for ultrafast THz detection. The LT-GaAs...
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Veröffentlicht in: | Journal of materials science. Materials in electronics 2018-07, Vol.29 (14), p.12436-12442 |
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Hauptverfasser: | , , , , , , , |
Format: | Artikel |
Sprache: | eng |
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Zusammenfassung: | The deposition of n-GaAs cap on low-temperature GaAs (LT-GaAs) improved the THz emission of LT-GaAs grown at a much lower temperature (<
300
∘
C), where the defect density is high, without compromising the spectral bandwidth and carrier lifetimes necessary for ultrafast THz detection. The LT-GaAs grown at
220
and
270
∘
C showed a 192 and 10% enhancement THz emission peak-to-peak intensity, respectively, while the sample grown at
310
∘
C showed a 49% reduction. The n-GaAs cap reduced the As-related defects density in the LT-GaAs resulting to improved THz emission. The THz emission from the sample grown at
310
∘
C with already low defect density suffered possibly due to the free carrier absorption by the n-GaAs cap. The results are relevant in future material design of LT-GaAs based photoconductive antenna. |
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ISSN: | 0957-4522 1573-482X |
DOI: | 10.1007/s10854-018-9360-1 |