Surface effect of n-GaAs cap on the THz emission in LT-GaAs

The deposition of n-GaAs cap on low-temperature GaAs (LT-GaAs) improved the THz emission of LT-GaAs grown at a much lower temperature (< 300 ∘ C), where the defect density is high, without compromising the spectral bandwidth and carrier lifetimes necessary for ultrafast THz detection. The LT-GaAs...

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Veröffentlicht in:Journal of materials science. Materials in electronics 2018-07, Vol.29 (14), p.12436-12442
Hauptverfasser: Balgos, Maria Herminia, Jaculbia, Rafael, Prieto, Elizabeth Ann, Mag-usara, Valynn Katrine, Tani, Masahiko, Salvador, Arnel, Estacio, Elmer, Somintac, Armando
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Sprache:eng
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Zusammenfassung:The deposition of n-GaAs cap on low-temperature GaAs (LT-GaAs) improved the THz emission of LT-GaAs grown at a much lower temperature (< 300 ∘ C), where the defect density is high, without compromising the spectral bandwidth and carrier lifetimes necessary for ultrafast THz detection. The LT-GaAs grown at 220 and 270 ∘ C showed a 192 and 10% enhancement THz emission peak-to-peak intensity, respectively, while the sample grown at 310 ∘ C showed a 49% reduction. The n-GaAs cap reduced the As-related defects density in the LT-GaAs resulting to improved THz emission. The THz emission from the sample grown at 310 ∘ C with already low defect density suffered possibly due to the free carrier absorption by the n-GaAs cap. The results are relevant in future material design of LT-GaAs based photoconductive antenna.
ISSN:0957-4522
1573-482X
DOI:10.1007/s10854-018-9360-1