New Roll-to-Roll Sputtering System for Wide Film and Application Examples

A new roll-to-roll sputtering system for wide film substrate is now under development; it is characterized by the connection of unit chambers in the horizontal direction. The new model is an improvement over previous models and is easily disassembled for shipping and assembled for installation; and it has kept the "open chamber concept" of previous models in the way in which the process chamber with sputtering source dynamically moves to the back of the equipment, which allows easy access to the coating zone. It also has sufficient degassing capability, thanks to a specialized degassing chamber unit. This system makes a suitable coating process for touch-panel displays or heat reflective film, etc., where the substrate film is wider. The other R2R coating system models are also introduced.