Effect of the Pressure of Working Gas on the Microcrystalline Structure and Magnetic Properties of the Co Film Deposited with the Aid of Magnetron Sputtering

Effect of argon pressure 0.09 ≤ P ≤ 1 Pa on the microcrystalline structure and magnetic properties of the cobalt films with a thickness of d ≈ 300 nm that are fabricated with the aid of magnetic sputtering on the SiO 2 /Si substrates is studied. It is demonstrated that the films obtained at a pressure of Р ≥ 0.2 Pa exhibit mixed crystal phase with close-packed hexagonal (CPH) and face-centered cubic (FCC) lattice with the CPH–Co(002)/FCC–Co(111) texture and column microstructure over thickness. The films deposited at a pressure of Р ≈ 0.09 Pa are characterized by the dominant FCC crystal phase with the FCC–Со(200) texture and inhomogeneous microstructure over thickness: at the interface with the substrate in a layer with a thickness of d 1 ≈ 150 nm, the films exhibit quasi-homogeneous microstructure that is transformed into the granulated microstructure at d > d 1 . The films deposited at a pressure of Р ≈ 0.09 Pa have the saturation magnetization that is higher by 30% and the coercive force and linewidth of ferromagnetic resonance that are several times less than those of the film obtained at a pressure of Р ≈ 1 Pa.