Efficient photocatalytic fixation of N2 by KOH-treated g-C3N4

Efficient photocatalytic fixation of N2 by KOH-treated g-C3N4

Development of N2 photofixation under mild conditions is challenging; one reason for low efficiency is the poor reactivity between water and photocatalysts. Herein, C3N4 after KOH etching was used as an efficient photocatalyst, and CH3OH was first introduced as a proton source. The photocatalyst pre...

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Veröffentlicht in:Journal of materials chemistry. A, Materials for energy and sustainability Materials for energy and sustainability, 2018-01, Vol.6 (7), p.3005-3011
Hauptverfasser: Li, Xiaoman, Sun, Xiang, Zhang, Ling, Sun, Songmei, Wang, Wenzhong
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Sprache:eng
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Ammonia
Carbon nitride
Etching
Photocatalysis
Photocatalysts
Protons
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container_title Journal of materials chemistry. A, Materials for energy and sustainability
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creator Li, Xiaoman
Sun, Xiang
Zhang, Ling
Sun, Songmei
Wang, Wenzhong
description Development of N2 photofixation under mild conditions is challenging; one reason for low efficiency is the poor reactivity between water and photocatalysts. Herein, C3N4 after KOH etching was used as an efficient photocatalyst, and CH3OH was first introduced as a proton source. The photocatalyst presented a high ammonia evolution rate of 3.632 mmol g−1 h−1 and achieved an apparent quantum yield of 21.5% at ∼420 nm. In addition to the role of reacting with holes to accelerate the production and transfer of electrons, CH3OH also promoted the solubility of N2 and provided a proton to the activated N2. The CH3OH system should be instructive for a better understanding of proton-enhanced photocatalysis.
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subjects Ammonia
Carbon nitride
Etching
Photocatalysis
Photocatalysts
Protons
title Efficient photocatalytic fixation of N2 by KOH-treated g-C3N4
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