Development of the Technology of Magnetron Sputtering Deposition of LiPON Films and Investigation of Their Characteristics

The results of developing the technology of magnetron sputtering deposition of a LiPON solid electrolyte and an experimental investigation of its characteristics are presented. The basic processing operations and parameters providing the formation of films of the proper morphology, structure, and el...

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Veröffentlicht in:Russian microelectronics 2017-11, Vol.46 (6), p.424-432
Hauptverfasser: Vasilev, S. V., Lebedev, M. E., Mazaletskii, L. A., Metlitskaya, A. V., Mironenko, A. A., Naumov, V. V., Novozhilova, A. V., Rudyi, A. S., Fedorov, I. S.
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Sprache:eng
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Zusammenfassung:The results of developing the technology of magnetron sputtering deposition of a LiPON solid electrolyte and an experimental investigation of its characteristics are presented. The basic processing operations and parameters providing the formation of films of the proper morphology, structure, and elemental and phase composition are described. The data of the measurement of the physical parameters of the films by cyclic voltammetry and potentiometry are represented.
ISSN:1063-7397
1608-3415
DOI:10.1134/S1063739717060099