High temperature isothermal oxidation behavior of NbSi^sub 2^ coating at 1000-1450 °C

High temperature isothermal oxidation behavior of NbSi^sub 2^ coating at 1000-1450 °C

Isothermal oxidation behavior of NbSi2 coating grown on Nb substrate was investigated in air at 1000-1450 °C. Oxidation rate of NbSi2 coating increased with temperature at 1000-1300 °C but opposite trend was observed at 1300-1450 °C. Maximum oxidation rate was obtained at 1300 °C due to the highest...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Corrosion science 2017-12, Vol.129, p.102
Hauptverfasser: Choi, Young-Jun, Yoon, Jin-Kook, Kim, Gyeung-Ho, Yoon, Woo-Young, Doh, Jung-Man, Hong, Kyung-Tae
Format: Artikel
Sprache:eng
Schlagworte:
Catalytic oxidation
Coating
Corrosion resistance
Densification
Epoxy coatings
High temperature
Oxidation rate
Oxidation resistance
Porosity
Scale (corrosion)
Silicon dioxide
Studies
Substrates
Viscous flow
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:Isothermal oxidation behavior of NbSi2 coating grown on Nb substrate was investigated in air at 1000-1450 °C. Oxidation rate of NbSi2 coating increased with temperature at 1000-1300 °C but opposite trend was observed at 1300-1450 °C. Maximum oxidation rate was obtained at 1300 °C due to the highest porosity of oxide scale. Lowest oxidation rate was observed at 1450 °C due to formation of dense oxide scale by combined effect of volatilization of Nb oxide phase, viscous flow and densification of c-SiO2. Oxidation resistance of NbSi2 coating at these temperatures was governed by some inter-related factors.
ISSN:0010-938X
1879-0496