Photonic Materials: Low‐Temperature Mullite Formation in Ternary Oxide Coatings Deposited by ALD for High‐Temperature Applications (Adv. Mater. Interfaces 23/2017)

Photonic Materials: Low‐Temperature Mullite Formation in Ternary Oxide Coatings Deposited by ALD for High‐Temperature Applications (Adv. Mater. Interfaces 23/2017)

Kaline P. Furlan, Robert Zierold, Rolf Janßen, and co‐workers develop an atomic layer deposition super cycle to coat photonic crystals with hightemperature stable films in article 1700912. By means of such ternary oxide coating the photonic crystal periodically organized structure is kept stable up...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Advanced materials interfaces 2017-12, Vol.4 (23), p.n/a
Hauptverfasser: Furlan, Kaline P., Krekeler, Tobias, Ritter, Martin, Blick, Robert, Schneider, Gerold A., Nielsch, Kornelius, Zierold, Robert, Janßen, Rolf
Format: Artikel
Sprache:eng
Schlagworte:
atomic layer deposition
Atomic layer epitaxy
Atomic properties
Atomic structure
Crystal structure
Crystallites
Electron microscopy
high‐temperature applications
Low temperature
Mullite
Oxide coatings
Photonic crystals
Scanning electron microscopy
thermal barrier coatings
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:Kaline P. Furlan, Robert Zierold, Rolf Janßen, and co‐workers develop an atomic layer deposition super cycle to coat photonic crystals with hightemperature stable films in article 1700912. By means of such ternary oxide coating the photonic crystal periodically organized structure is kept stable up to 1400 °C, which is an outstanding behavior concerning the temperature stability. The scanning electron microscopy image shows a top view of a mullite coated photonic crystal, in which the nanosized mullite crystallites are visualized.
ISSN:2196-7350
2196-7350
DOI:10.1002/admi.201770122