Fabrication of ultra-low antireflection SiNWs arrays from mc-Si using one step MACE

In this work, SiNWs arrays were fabricated from mc-Si wafer using one step nano-silver catalyzed chemical etching method. The effect of AgNO 3 concentration on morphology structure, antireflection property and effective carrier lifetime of textured mc-Si were carefully studied. The results indicate...

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Veröffentlicht in:Journal of materials science. Materials in electronics 2017-06, Vol.28 (12), p.8510-8518
Hauptverfasser: Zhang, Cong, Li, Shaoyuan, Ma, Wenhui, Ding, Zhao, Wan, Xiaohan, Yang, Jia, Chen, Zhengjie, Zou, Yuxin, Qiu, Jiajia
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Sprache:eng
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