Characteristics of IGZO/Ni/IGZO tri-layer films deposited by DC and RF magnetron sputtering

•IGZO and IGZO/Ni/IGZO tri-layer films were deposited on a PC substrate with RF and DC magnetron sputtering.•The influence of the Ni interlayer on the structural, electrical, and optical properties is considered.•IGZO films with a 15-nm thick Ni interlayer showed a lower resistivity of 4.74×10−4Ωcm. Transparent and conductive IGZO/Ni/IGZO tri-layer films were deposited on a poly-carbonate substrate using RF and DC magnetron sputtering in order to achieve high transmittance in the visible range and low emissivity in the infrared range. The influence of the Ni interlayer on the structural and optical properties of the films was then investigated. Although the observed XRD pattern indicates that the IGZO films are amorphous structures, the surface roughness and electrical conductivity increased as the thickness of the Ni interlayer increased. In addition, the rough surface and enhanced carrier density of the films due to the Ni interlayer results in the decreased visible transmittance and low emissivity of the films.