Micro cell array on silicon substrate using graphene sheet

•Graphene sheet has been used in the miniaturization process.•Graphene sheet was partially etched by plasma treatment in O2 gas environment.•Graphene sheet was fluorinated by plasma treatment in C3F8 gas environment.•Fluorinated graphene sheet artificially control the adhesion of cell.•Fluorinated graphene sheet was used as a passivation layer for micro-cell array. To fabricate micro-patterns for bioengineering applications, we used graphene sheet, metal mask, and plasma treatment rather than the commonly used photolithography process. Two types of micro-patterns were fabricated (line, and circle) on SiO2/Si (100, p-typed) substrate. In the line and circle micro-patterns, graphene etched areas were 100 and 150μm, respectively, with fluorinated graphene spacing. The efficiencies of early cell adhesion, which is necessary for the growth and proliferation of cells, were 62, 17, and 65% on the pristine, fluorinated, and etched graphene surface, respectively, for 6h of cell culture. After seeding the neuron cells on the patterned substrate, neuron cells proliferated and differentiated along the graphene etched regions. The graphene sheet was used as a passivation layer for micro-array of the neuron cell on SiO2/Si.