Pine shaped InN nanostructure growth via vapour transport method by own shadowing and infrared detection

We have demonstrated the synthesis of Indium Nitride (InN) Nanopines (NПs) array on Si substrate using Oblique Angle Deposition (OAD) technique. The deposited InN NПs have an average height of ∼2 μm. The grown InN NПs are hexagonal in nature and have prominent diffraction peak along orientation. The...

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Veröffentlicht in:Journal of alloys and compounds 2017-10, Vol.722, p.872-877
Hauptverfasser: Dwivedi, Shyam Murli Manohar Dhar, Chakrabartty, Shubhro, Ghadi, Hemant, Murkute, Punam, Chavan, Vinayak, Chakrabarti, Subhananda, Bhunia, Satyaban, Mondal, Aniruddha
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Sprache:eng
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Zusammenfassung:We have demonstrated the synthesis of Indium Nitride (InN) Nanopines (NПs) array on Si substrate using Oblique Angle Deposition (OAD) technique. The deposited InN NПs have an average height of ∼2 μm. The grown InN NПs are hexagonal in nature and have prominent diffraction peak along orientation. The X-ray photoelectron spectroscopy (XPS) measurement confirms the presence of InN bonds. An Optical absorption spectroscopy reveals high band gap absorption at approximately 1.15 eV. The carrier concentration of (∼1.8 × 1020 cm−3) was determined using capacitance (C) – voltage (V) measurement. The infrared detection with maximum responsivity at 1.14 eV (∼1078 nm) was obtained near the optical band edge at 10 K. A low device sensitivity was observed with an increasing operating temperature. [Display omitted] •A Unique technique has been developed to synthesis InN nanopines.•High quality InN was dominated by orientation.•The XPS analysis revealed that the growth of pure phase InN.•High carrier concentration produced high optical band gap of InN.•Selective infrared wavelength detection at 1078 nm (1.14 eV) was obtained.
ISSN:0925-8388
1873-4669
DOI:10.1016/j.jallcom.2017.06.184