Diamond Schottky-pn diode using lightly nitrogen-doped layer

We successfully fabricated diamond Schottky-pn diodes (SPNDs) using a lightly nitrogen-doped (N-doped) layer. The diamond SPNDs showed a high forward current density of over 20,000A/cm2 at 7V, a high rectification ratio of over 1013, and a high breakdown electric field of 3.3MV/cm at room temperatur...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Diamond and related materials 2017-05, Vol.75, p.152-154
Hauptverfasser: Matsumoto, Tsubasa, Mukose, Takaki, Makino, Toshiharu, Takeuchi, Daisuke, Yamasaki, Satoshi, Inokuma, Takao, Tokuda, Norio
Format: Artikel
Sprache:eng
Schlagworte:
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:We successfully fabricated diamond Schottky-pn diodes (SPNDs) using a lightly nitrogen-doped (N-doped) layer. The diamond SPNDs showed a high forward current density of over 20,000A/cm2 at 7V, a high rectification ratio of over 1013, and a high breakdown electric field of 3.3MV/cm at room temperature. These properties mean that the N-doped layer acted as an n-type semiconductor. The N-doped n-type layer is effective in the SPNDs as same as a phosphorus-doped n-type layer. [Display omitted] •We successfully fabricated diamond Schottky-pn diodes (SPNDs) using a lightly nitrogen-doped (N-doped) layer.•The diamond SPNDs showed a high forward current density of over 20,000A/cm2 at 7V and a high rectification ratio of over 1013.•The breakdown electric field reached 3.3MV/cm.
ISSN:0925-9635
1879-0062
DOI:10.1016/j.diamond.2017.03.018