Effect of correlation of interacting particle masses on metal and compound sputtering

The dependence of sputtering coefficients of polycrystals of some metals and binary compositions on the mass of bombarding ions with the energies in the range 200–2000 eV was studied by the molecular dynamics technique. The dependence of sputtering on target parameters was investigated. Targets with both similar and different densities, lattice constants, and surface binding energies were considered. Sputtering coefficients, source depths, mean energies, and the number of sputtered particle generations were calculated. Peculiarities of the obtained dependences are explained.