Influence of the chemical structure of (co)polymer resists on their sensitivity to radiation

Influence of the chemical structure of (co)polymer resists on their sensitivity to radiation

Resists operating via two mechanisms, i.e., disruption of the main chain and hydrolysis of side functional groups occurring upon EUV and electron beam irradiation, are studied as a function of the chemical composition of a polymer substrate. We show that the latter, belonging to the group of chemica...

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Veröffentlicht in:Bulletin of the Russian Academy of Sciences. Physics 2012-02, Vol.76 (2), p.159-162
Hauptverfasser: Bulgakova, S. A., Johns, M. M., Kiseleva, E. A., Skorokhodov, E. V., Pestov, A. E., Lopatin, A. Ya, Gusev, S. A., Luchin, V. I., Chkhalo, N. I., Salashchenko, N. N.
Format: Artikel
Sprache:eng
Schlagworte:
Chains (polymeric)
Chemical composition
Disruption
Electron beams
Electron irradiation
Functional groups
Hadrons
Heavy Ions
Hydrolysis
Nuclear Physics
Physics
Physics and Astronomy
Proceedings of the International Symposium “Nanophysics and Nanoelectronics-2011”
Resists
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Zusammenfassung:Resists operating via two mechanisms, i.e., disruption of the main chain and hydrolysis of side functional groups occurring upon EUV and electron beam irradiation, are studied as a function of the chemical composition of a polymer substrate. We show that the latter, belonging to the group of chemically amplified resists, are an order of magnitude more sensitive to radiation and possess outstanding contrast, as compared with disruptive type resists.
ISSN:1062-8738
1934-9432
DOI:10.3103/S1062873812020050