Pulsed photonic fabrication of nanostructured metal oxide thin films

Nanostructured metal oxide thin films with a large specific surface area are preferable for practical device applications in energy conversion and storage. Herein, we report instantaneous (milliseconds) photonic synthesis of three-dimensional (3-D) nanostructured metal oxide thin films through the p...

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Veröffentlicht in:Applied physics. A, Materials science & processing Materials science & processing, 2017-09, Vol.123 (9), p.1-6, Article 588
Hauptverfasser: Bourgeois, Briley B., Luo, Sijun, Riggs, Brian C., Adireddy, Shiva, Chrisey, Douglas B.
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Sprache:eng
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Zusammenfassung:Nanostructured metal oxide thin films with a large specific surface area are preferable for practical device applications in energy conversion and storage. Herein, we report instantaneous (milliseconds) photonic synthesis of three-dimensional (3-D) nanostructured metal oxide thin films through the pulsed photoinitiated pyrolysis of organometallic precursor films made by chemical solution deposition. High wall-plug efficiency-pulsed photonic irradiation (xenon flash lamp, pulse width of 1.93 ms, fluence of 7.7 J/cm 2 and frequency of 1.2 Hz) is used for scalable photonic processing. The photothermal effect of subsequent pulses rapidly improves the crystalline quality of nanocrystalline metal oxide thin films in minutes. The following paper highlights pulsed photonic fabrication of 3-D nanostructured TiO 2 , Co 3 O 4 , and Fe 2 O 3 thin films, exemplifying a promising new method for the low-cost and high-throughput manufacturing of nanostructured metal oxide thin films for energy applications.
ISSN:0947-8396
1432-0630
DOI:10.1007/s00339-017-1203-z