Copolymers based on (p-vinylphenyl)cyclopropylmethyl chlorocinnamate and methyl methacrylate

—Copolymers of ( p -vinylphenyl)cyclopropylmethyl chlorocinnamate with methyl methacrylate were prepared by radical copolymerization. The copolymerization constants were determined, and the Alfrey–Price Q–e parameters were calculated. The possibility of photochemical cross-linking of the copolymer via double bond conjugated with the carbonyl group in the chlorocinnamate moiety and via the cyclopropane ring was demonstrated. The copolymer obtained exhibits sufficiently high photosensitivity (54.5 cm 2 J –1 ) and high refractive index ( n D 20 1.5890), which opens prospects for using it as a photosensitive base of negative photoresists and in optics.