P‐61: Development of High Sensitivity PAC material for improve Aligner Lens Mura
Negative PAC is very sensitive to photo and has higher productivity. However, this type is prone to mura formed during the exposure and development. We have been developed lens mura free material. PAC Hole closing caused by increasing photo sensitivity can be solved by Mask OPC technology.
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| Veröffentlicht in: | SID International Symposium Digest of technical papers 2017-05, Vol.48 (1), p.1472-1475 |
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| container_end_page | 1475 |
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| container_issue | 1 |
| container_start_page | 1472 |
| container_title | SID International Symposium Digest of technical papers |
| container_volume | 48 |
| creator | Na, Younsung Min, Sungsik Kang, Dongwoo Choi, Youngseok Shin, SangMun |
| description | Negative PAC is very sensitive to photo and has higher productivity. However, this type is prone to mura formed during the exposure and development. We have been developed lens mura free material. PAC Hole closing caused by increasing photo sensitivity can be solved by Mask OPC technology. |
| doi_str_mv | 10.1002/sdtp.11926 |
| format | Article |
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| identifier | ISSN: 0097-966X |
| ispartof | SID International Symposium Digest of technical papers, 2017-05, Vol.48 (1), p.1472-1475 |
| issn | 0097-966X 2168-0159 |
| language | eng |
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| source | Wiley Online Library Journals Frontfile Complete |
| subjects | Alignment Exposure Lens Overlap Mura Lenses Mask Optical Proximity Correction Nikon Exposure PAC Hole Photo Acryl Compound Productivity Sensitivity |
| title | P‐61: Development of High Sensitivity PAC material for improve Aligner Lens Mura |
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