P‐61: Development of High Sensitivity PAC material for improve Aligner Lens Mura

Negative PAC is very sensitive to photo and has higher productivity. However, this type is prone to mura formed during the exposure and development. We have been developed lens mura free material. PAC Hole closing caused by increasing photo sensitivity can be solved by Mask OPC technology.

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Bibliographische Detailangaben
Veröffentlicht in:	SID International Symposium Digest of technical papers 2017-05, Vol.48 (1), p.1472-1475
Hauptverfasser:	Na, Younsung, Min, Sungsik, Kang, Dongwoo, Choi, Youngseok, Shin, SangMun
Format:	Artikel
Sprache:	eng
Schlagworte:	Alignment Exposure Lens Overlap Mura Lenses Mask Optical Proximity Correction Nikon Exposure PAC Hole Photo Acryl Compound Productivity Sensitivity
Online-Zugang:	Volltext
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Beschreibung
Zusammenfassung:	Negative PAC is very sensitive to photo and has higher productivity. However, this type is prone to mura formed during the exposure and development. We have been developed lens mura free material. PAC Hole closing caused by increasing photo sensitivity can be solved by Mask OPC technology.
ISSN:	0097-966X 2168-0159
DOI:	10.1002/sdtp.11926