76‐1: Invited Paper: Optimization of Applied Materials PiVotTM Array Coater for Metal Oxide Semiconductor Layers

Applied Materials' static PVD array coater using rotary targets has been developed to provide less in‐film particle, high target utilization performance by novel rotary target technology and uniform layer deposition by unique magnet motion in display industry. It has been optimized to provide h...

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Veröffentlicht in:	SID International Symposium Digest of technical papers 2017-05, Vol.48 (1), p.1108-1111
Hauptverfasser:	Park, Hyun Chan, Kloeppel, Andreas, Bhoolokam, Ajay Sampath, Hanika, Markus, Bender, Marcus, Busch, John D, Hsu, Hao-Chien, Yim, Dong Kil
Format:	Artikel
Sprache:	eng
Schlagworte:	Bipolar Pulsed D C Coating Deposition Glass IGZO Metal Oxide Active Layer Metal oxide semiconductors Metal oxides Optimization Physical vapor deposition Pivot Rotary Target
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Beschreibung
Zusammenfassung:	Applied Materials' static PVD array coater using rotary targets has been developed to provide less in‐film particle, high target utilization performance by novel rotary target technology and uniform layer deposition by unique magnet motion in display industry. It has been optimized to provide highly stable and uniform thin metal oxide layer to reach uniform TFT performance for large area substrate (2500x2200mm glass size).
ISSN:	0097-966X 2168-0159
DOI:	10.1002/sdtp.11843