Use of Supramolecular Assemblies as Lithographic Resists

A new resist material for electron beam lithography has been created that is based on a supramolecular assembly. Initial studies revealed that with this supramolecular approach, high‐resolution structures can be written that show unprecedented selectivity when exposed to etching conditions involving...

Ausführliche Beschreibung

Bibliographische Detailangaben

Veröffentlicht in:	Angewandte Chemie 2017-06, Vol.129 (24), p.6853-6856
Hauptverfasser:	Lewis, Scott M., Fernandez, Antonio, DeRose, Guy A., Hunt, Matthew S., Whitehead, George F. S., Lagzda, Agnese, Alty, Hayden R., Ferrando‐Soria, Jesus, Varey, Sarah, Kostopoulos, Andreas K., Schedin, Fredrik, Muryn, Christopher A., Timco, Grigore A., Scherer, Axel, Yeates, Stephen G., Winpenny, Richard E. P.
Format:	Artikel
Sprache:	eng
Schlagworte:	Chemistry Electron beam lithography Electrons Etching Heterometallische Verbindungen High resolution Lithographie Lithography Plasma Plasmas (physics) Resistmaterialien Resists Selectivity Supramolekulare Strukturen
Online-Zugang:	Volltext
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!