Photoelectrochemical properties of thin films on titanium obtained by thermal, electrochemical, or sol-gel method

The photosensitivity of the titanium dioxide films on titanium substrate formed by the electrochemical, thermal, or sol-gel method was compared under the same conditions. The surface topologies of the samples were characterized by the atomic-force microscopy. It was found that the comparable increases of the sample photopotentials were observed either after the introducing of F ¯ -containing component into the anodizing solution or after the annealing of pure titanium at 500 °C. The cumulative effect of the anodic oxidation and further heat treatment of titanium on IPCE of Ti|TiO 2 system was established.