Weak antilocalization in thin films of the Bi2Te2.7Se0.3 solid solution

A technology has been developed for the preparation of thin films of the Bi 2 Te 2.7 Se 0.3 solid solution through the thermal evaporation in a vacuum using the “hot-wall” method. The high quality of the thin films thus prepared has been confirmed by the X-ray diffraction and Raman scattering data....

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Veröffentlicht in:Physics of the solid state 2016-09, Vol.58 (9), p.1870-1875
Hauptverfasser: Abdullaev, N. A., Alekperov, O. Z., Aligulieva, Kh. V., Zverev, V. N., Kerimova, A. M., Mamedov, N. T.
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Sprache:eng
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Zusammenfassung:A technology has been developed for the preparation of thin films of the Bi 2 Te 2.7 Se 0.3 solid solution through the thermal evaporation in a vacuum using the “hot-wall” method. The high quality of the thin films thus prepared has been confirmed by the X-ray diffraction and Raman scattering data. The electron transport has been investigated over wide ranges of temperatures (1.4–300 K) and magnetic fields (up to 8 T). It has been assumed that the observed weak antilocalization is associated with the dominant contribution from the surface states of a topological insulator. The dephasing length has been estimated.
ISSN:1063-7834
1090-6460
DOI:10.1134/S106378341609002X