Weak antilocalization in thin films of the Bi2Te2.7Se0.3 solid solution
A technology has been developed for the preparation of thin films of the Bi 2 Te 2.7 Se 0.3 solid solution through the thermal evaporation in a vacuum using the “hot-wall” method. The high quality of the thin films thus prepared has been confirmed by the X-ray diffraction and Raman scattering data....
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Veröffentlicht in: | Physics of the solid state 2016-09, Vol.58 (9), p.1870-1875 |
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Hauptverfasser: | , , , , , |
Format: | Artikel |
Sprache: | eng |
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Online-Zugang: | Volltext |
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Zusammenfassung: | A technology has been developed for the preparation of thin films of the Bi
2
Te
2.7
Se
0.3
solid solution through the thermal evaporation in a vacuum using the “hot-wall” method. The high quality of the thin films thus prepared has been confirmed by the X-ray diffraction and Raman scattering data. The electron transport has been investigated over wide ranges of temperatures (1.4–300 K) and magnetic fields (up to 8 T). It has been assumed that the observed weak antilocalization is associated with the dominant contribution from the surface states of a topological insulator. The dephasing length has been estimated. |
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ISSN: | 1063-7834 1090-6460 |
DOI: | 10.1134/S106378341609002X |