A silicon field-effect hall sensor with an extended operating temperature range
The characteristics of thin-film Si MISIM magnetic transistors with a built-in accumulated channel and partially depleted quasi-neutral area are studied. The design of transistors is integrated with a Hall element. It is shown experimentally that transistors of this type, which were named field-effe...
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Veröffentlicht in: | Instruments and experimental techniques (New York) 2016-09, Vol.59 (5), p.724-727 |
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creator | Leonov, A. V. Malykh, A. A. Mordkovich, V. N. Pavlyuk, M. I. |
description | The characteristics of thin-film Si MISIM magnetic transistors with a built-in accumulated channel and partially depleted quasi-neutral area are studied. The design of transistors is integrated with a Hall element. It is shown experimentally that transistors of this type, which were named field-effect Hall sensors (FEHSs) and made by the “silicon-on-insulator” (SOI) technology, provide measurements of the magnetic induction in a temperature range of 1.7–605 K. Theoretical estimates show that the upper operating temperature limit of the FEHS can be about 850 K. |
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fullrecord | <record><control><sourceid>proquest_cross</sourceid><recordid>TN_cdi_proquest_journals_1880861904</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>1880861904</sourcerecordid><originalsourceid>FETCH-LOGICAL-c316t-62ed4ee6002deabf59143a4d664d8434e5a9501e87842fef095ad20324b2c67c3</originalsourceid><addsrcrecordid>eNp1UE1LAzEQDaJgrf4AbwHPq5OPzWaPpagVCj2o5yXdTNot22xNUtR_b2o9COJpHryPmXmEXDO4ZUzIu2cADlIyzhSUwKA-IaMMdSGYhlMyOtDFgT8nFzFuAKCuqmpEFhMau75rB09dh70t0DlsE12bvqcRfRwCfe_SmhpP8SOht2jpsMNgUudXNOH2G-8D0mD8Ci_JmTN9xKufOSavD_cv01kxXzw-TSfzohVMpUJxtBJR5bMsmqUrayaFkVYpabUUEktT5zdQV1pyhw7q0lgOgsslb1XVijG5OebuwvC2x5iazbAPPq9smNagFatBZhU7qtowxBjQNbvQbU34bBg0h96aP71lDz96Ytbmj8Kv5H9NX8gZbjo</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>1880861904</pqid></control><display><type>article</type><title>A silicon field-effect hall sensor with an extended operating temperature range</title><source>SpringerLink Journals</source><creator>Leonov, A. V. ; Malykh, A. A. ; Mordkovich, V. N. ; Pavlyuk, M. I.</creator><creatorcontrib>Leonov, A. V. ; Malykh, A. A. ; Mordkovich, V. N. ; Pavlyuk, M. I.</creatorcontrib><description>The characteristics of thin-film Si MISIM magnetic transistors with a built-in accumulated channel and partially depleted quasi-neutral area are studied. The design of transistors is integrated with a Hall element. It is shown experimentally that transistors of this type, which were named field-effect Hall sensors (FEHSs) and made by the “silicon-on-insulator” (SOI) technology, provide measurements of the magnetic induction in a temperature range of 1.7–605 K. Theoretical estimates show that the upper operating temperature limit of the FEHS can be about 850 K.</description><identifier>ISSN: 0020-4412</identifier><identifier>EISSN: 1608-3180</identifier><identifier>DOI: 10.1134/S0020441216050109</identifier><language>eng</language><publisher>Moscow: Pleiades Publishing</publisher><subject>Electrical Engineering ; General Experimental Techniques ; Hall effect ; Magnetic induction ; Measurement Science and Instrumentation ; Operating temperature ; Physical Chemistry ; Physics ; Physics and Astronomy ; Semiconductor devices ; Silicon ; SOI (semiconductors) ; Transistors</subject><ispartof>Instruments and experimental techniques (New York), 2016-09, Vol.59 (5), p.724-727</ispartof><rights>Pleiades Publishing, Inc. 2016</rights><rights>Copyright Springer Science & Business Media 2016</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c316t-62ed4ee6002deabf59143a4d664d8434e5a9501e87842fef095ad20324b2c67c3</citedby><cites>FETCH-LOGICAL-c316t-62ed4ee6002deabf59143a4d664d8434e5a9501e87842fef095ad20324b2c67c3</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktopdf>$$Uhttps://link.springer.com/content/pdf/10.1134/S0020441216050109$$EPDF$$P50$$Gspringer$$H</linktopdf><linktohtml>$$Uhttps://link.springer.com/10.1134/S0020441216050109$$EHTML$$P50$$Gspringer$$H</linktohtml><link.rule.ids>314,780,784,27924,27925,41488,42557,51319</link.rule.ids></links><search><creatorcontrib>Leonov, A. V.</creatorcontrib><creatorcontrib>Malykh, A. A.</creatorcontrib><creatorcontrib>Mordkovich, V. N.</creatorcontrib><creatorcontrib>Pavlyuk, M. I.</creatorcontrib><title>A silicon field-effect hall sensor with an extended operating temperature range</title><title>Instruments and experimental techniques (New York)</title><addtitle>Instrum Exp Tech</addtitle><description>The characteristics of thin-film Si MISIM magnetic transistors with a built-in accumulated channel and partially depleted quasi-neutral area are studied. The design of transistors is integrated with a Hall element. It is shown experimentally that transistors of this type, which were named field-effect Hall sensors (FEHSs) and made by the “silicon-on-insulator” (SOI) technology, provide measurements of the magnetic induction in a temperature range of 1.7–605 K. Theoretical estimates show that the upper operating temperature limit of the FEHS can be about 850 K.</description><subject>Electrical Engineering</subject><subject>General Experimental Techniques</subject><subject>Hall effect</subject><subject>Magnetic induction</subject><subject>Measurement Science and Instrumentation</subject><subject>Operating temperature</subject><subject>Physical Chemistry</subject><subject>Physics</subject><subject>Physics and Astronomy</subject><subject>Semiconductor devices</subject><subject>Silicon</subject><subject>SOI (semiconductors)</subject><subject>Transistors</subject><issn>0020-4412</issn><issn>1608-3180</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2016</creationdate><recordtype>article</recordtype><recordid>eNp1UE1LAzEQDaJgrf4AbwHPq5OPzWaPpagVCj2o5yXdTNot22xNUtR_b2o9COJpHryPmXmEXDO4ZUzIu2cADlIyzhSUwKA-IaMMdSGYhlMyOtDFgT8nFzFuAKCuqmpEFhMau75rB09dh70t0DlsE12bvqcRfRwCfe_SmhpP8SOht2jpsMNgUudXNOH2G-8D0mD8Ci_JmTN9xKufOSavD_cv01kxXzw-TSfzohVMpUJxtBJR5bMsmqUrayaFkVYpabUUEktT5zdQV1pyhw7q0lgOgsslb1XVijG5OebuwvC2x5iazbAPPq9smNagFatBZhU7qtowxBjQNbvQbU34bBg0h96aP71lDz96Ytbmj8Kv5H9NX8gZbjo</recordid><startdate>20160901</startdate><enddate>20160901</enddate><creator>Leonov, A. V.</creator><creator>Malykh, A. A.</creator><creator>Mordkovich, V. N.</creator><creator>Pavlyuk, M. I.</creator><general>Pleiades Publishing</general><general>Springer Nature B.V</general><scope>AAYXX</scope><scope>CITATION</scope></search><sort><creationdate>20160901</creationdate><title>A silicon field-effect hall sensor with an extended operating temperature range</title><author>Leonov, A. V. ; Malykh, A. A. ; Mordkovich, V. N. ; Pavlyuk, M. I.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c316t-62ed4ee6002deabf59143a4d664d8434e5a9501e87842fef095ad20324b2c67c3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2016</creationdate><topic>Electrical Engineering</topic><topic>General Experimental Techniques</topic><topic>Hall effect</topic><topic>Magnetic induction</topic><topic>Measurement Science and Instrumentation</topic><topic>Operating temperature</topic><topic>Physical Chemistry</topic><topic>Physics</topic><topic>Physics and Astronomy</topic><topic>Semiconductor devices</topic><topic>Silicon</topic><topic>SOI (semiconductors)</topic><topic>Transistors</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Leonov, A. V.</creatorcontrib><creatorcontrib>Malykh, A. A.</creatorcontrib><creatorcontrib>Mordkovich, V. N.</creatorcontrib><creatorcontrib>Pavlyuk, M. I.</creatorcontrib><collection>CrossRef</collection><jtitle>Instruments and experimental techniques (New York)</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Leonov, A. V.</au><au>Malykh, A. A.</au><au>Mordkovich, V. N.</au><au>Pavlyuk, M. I.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>A silicon field-effect hall sensor with an extended operating temperature range</atitle><jtitle>Instruments and experimental techniques (New York)</jtitle><stitle>Instrum Exp Tech</stitle><date>2016-09-01</date><risdate>2016</risdate><volume>59</volume><issue>5</issue><spage>724</spage><epage>727</epage><pages>724-727</pages><issn>0020-4412</issn><eissn>1608-3180</eissn><abstract>The characteristics of thin-film Si MISIM magnetic transistors with a built-in accumulated channel and partially depleted quasi-neutral area are studied. The design of transistors is integrated with a Hall element. It is shown experimentally that transistors of this type, which were named field-effect Hall sensors (FEHSs) and made by the “silicon-on-insulator” (SOI) technology, provide measurements of the magnetic induction in a temperature range of 1.7–605 K. Theoretical estimates show that the upper operating temperature limit of the FEHS can be about 850 K.</abstract><cop>Moscow</cop><pub>Pleiades Publishing</pub><doi>10.1134/S0020441216050109</doi><tpages>4</tpages></addata></record> |
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subjects | Electrical Engineering General Experimental Techniques Hall effect Magnetic induction Measurement Science and Instrumentation Operating temperature Physical Chemistry Physics Physics and Astronomy Semiconductor devices Silicon SOI (semiconductors) Transistors |
title | A silicon field-effect hall sensor with an extended operating temperature range |
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