A silicon field-effect hall sensor with an extended operating temperature range

The characteristics of thin-film Si MISIM magnetic transistors with a built-in accumulated channel and partially depleted quasi-neutral area are studied. The design of transistors is integrated with a Hall element. It is shown experimentally that transistors of this type, which were named field-effe...

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Veröffentlicht in:Instruments and experimental techniques (New York) 2016-09, Vol.59 (5), p.724-727
Hauptverfasser: Leonov, A. V., Malykh, A. A., Mordkovich, V. N., Pavlyuk, M. I.
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Sprache:eng
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Zusammenfassung:The characteristics of thin-film Si MISIM magnetic transistors with a built-in accumulated channel and partially depleted quasi-neutral area are studied. The design of transistors is integrated with a Hall element. It is shown experimentally that transistors of this type, which were named field-effect Hall sensors (FEHSs) and made by the “silicon-on-insulator” (SOI) technology, provide measurements of the magnetic induction in a temperature range of 1.7–605 K. Theoretical estimates show that the upper operating temperature limit of the FEHS can be about 850 K.
ISSN:0020-4412
1608-3180
DOI:10.1134/S0020441216050109