Gas release of the dielectric coating of an anode and its effect on the characteristics of an ion diode with electron flux insulation by a radial magnetic field
Generation of an ion beam by an ion diode is accompanied by the release of gas from the surface of the dielectric coating of the anode. The magnitude of the pulse pressure of gas in the vacuum chamber depends on the type of the dielectric used and can reach 6 × 10 –4 –2 × 10 –3 mm Hg. The magnitude...
Gespeichert in:
Veröffentlicht in: | Technical physics letters 2017, Vol.43 (1), p.12-15 |
---|---|
Hauptverfasser: | , , , , |
Format: | Artikel |
Sprache: | eng |
Schlagworte: | |
Online-Zugang: | Volltext |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Zusammenfassung: | Generation of an ion beam by an ion diode is accompanied by the release of gas from the surface of the dielectric coating of the anode. The magnitude of the pulse pressure of gas in the vacuum chamber depends on the type of the dielectric used and can reach 6 × 10
–4
–2 × 10
–3
mm Hg. The magnitude of the limit vacuum chamber pressure at which ion beam parameters remain constant has been found. Characteristics of the ion beam current in the vacuum chamber pressure range of 2 × 10
–4
–1.3 × 10
–3
mm Hg are presented. |
---|---|
ISSN: | 1063-7850 1090-6533 |
DOI: | 10.1134/S1063785016120087 |