Dielectric nanostructures with high laser damage threshold

Dielectric nanostructures with high laser damage threshold

Dielectric-based metamaterials are proposed to be the ideal candidates for low-loss, high-efficiency devices. However, to employ dielectric nanostructures for high-power applications, the dielectric material must have a high laser-induced damaged threshold (LIDT) value. In this work, we investigated...

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Veröffentlicht in:Applied physics. A, Materials science & processing Materials science & processing, 2017-02, Vol.123 (2), p.1-5, Article 115
Hauptverfasser: Ngo, C. Y., Hong, L. Y., Deng, J., Khoo, E. H., Liu, Z., Wu, R. F., Teng, J. H.
Format: Artikel
Sprache:eng
Schlagworte:
Applied physics
Characterization and Evaluation of Materials
Condensed Matter Physics
Devices
Dielectrics
Fluence
Laser applications
Laser damage
Lasers
Lenses
Machines
Manufacturing
Materials science
Metamaterials
Nanostructure
Nanotechnology
Optical and Electronic Materials
Physics
Physics and Astronomy
Power efficiency
Processes
Silicon dioxide
Surfaces and Interfaces
Thin Films
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Zusammenfassung:Dielectric-based metamaterials are proposed to be the ideal candidates for low-loss, high-efficiency devices. However, to employ dielectric nanostructures for high-power applications, the dielectric material must have a high laser-induced damaged threshold (LIDT) value. In this work, we investigated the LIDT values of dielectric nanostructures for high-power fiber laser applications. Consequently, we found that the fabricated SiO 2 nanostructured lens can withstand laser fluence exceeding 100 J/cm 2 .
ISSN:0947-8396
1432-0630
DOI:10.1007/s00339-016-0751-y