Investigation of Carrier Transport Mechanism in High Mobility ZnON Thin-Film Transistors
In this letter, the carrier transport mechanism in a high-mobility zinc oxynitride (ZnON) thin-film transistor (TFT) is investigated by analyzing the gate bias and temperature dependence of conductance and intrinsic field-effect mobility (μ FEi ) in the subthreshold and above-threshold regions, resp...
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Veröffentlicht in: | IEEE electron device letters 2016-12, Vol.37 (12), p.1570-1573 |
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Format: | Artikel |
Sprache: | eng |
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Zusammenfassung: | In this letter, the carrier transport mechanism in a high-mobility zinc oxynitride (ZnON) thin-film transistor (TFT) is investigated by analyzing the gate bias and temperature dependence of conductance and intrinsic field-effect mobility (μ FEi ) in the subthreshold and above-threshold regions, respectively. The measured drain currents increase with a temperature and show a thermally activated Arrhenius-like behavior in the subthreshold region. The experimental results are well explained using a Meyer-Neldel rule, which suggests that the trap-limited conduction is the dominant carrier transport mechanism in the ZnON TFT in the subthreshold region. The carrier transport mechanism in the ZnON TFT in the above-threshold region is investigated by examining the gate overdrive voltage (V OV ) and temperature dependence of μ FEi . μ FEi extracted from the ZnON TFT decreases with an increase in V OV and temperature, which suggests that the phonon scattering is the most probable mechanism limiting μ FEi in the ZnON TFT in the above-threshold region. |
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ISSN: | 0741-3106 1558-0563 |
DOI: | 10.1109/LED.2016.2619684 |