マグネトロンスパッタ法により作製したリン酸リチウムオキシナイトライド固体電解質薄膜のイオン伝導性に及ぼす導入ガス中窒素濃度の影響

マグネトロンスパッタ法により作製したリン酸リチウムオキシナイトライド固体電解質薄膜のイオン伝導性に及ぼす導入ガス中窒素濃度の影響

Amorphous lithium phosphorus oxynitride (LiPON) thin films were deposited on SUS plates from a Li3PO4 target using RF magnetron sputtering with induction gas having various N2 concentrations. The ionic conductivity of the amorphous LiPON films was approximately 7.6×10－6 S･cm－1 at 75% N2 concentratio...

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Veröffentlicht in:Hyōmen gijutsu 2015/11/01, Vol.66(11), pp.540-543
Hauptverfasser: 金子, 信悟, 横溝, 美衣子, 望月, 康正, 嵐田, 敏彦, 笹元, 貴弘, 田邉, 豊和, 松本, 太
Format: Artikel
Sprache:jpn
Schlagworte:
Amorphous Solid Electrolyte
Higher Order Structure
Ion currents
LiPON
Lithium
Lithium-ion Secondary Battery
Magnetron sputtering
Oxynitrides
Sputtering Pressure
Thin films
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Zusammenfassung:Amorphous lithium phosphorus oxynitride (LiPON) thin films were deposited on SUS plates from a Li3PO4 target using RF magnetron sputtering with induction gas having various N2 concentrations. The ionic conductivity of the amorphous LiPON films was approximately 7.6×10－6 S･cm－1 at 75% N2 concentration, at which both doubly and triply phosphorus-coordinated nitrogen units would be linked to the Li3PO4 structure.
ISSN:0915-1869
1884-3409
DOI:10.4139/sfj.66.540