Characterization and Development of High Dose Implanted Resist Stripping Processes

With the increase of implantation dose in new technologies, implanted photoresist stripping is even more challenged in terms of efficiency and substrate consumption. In this work, the effect of implantation parameters (energy and implanted specie) on the photoresist modifications are studied and several plasma chemistries are evaluated to remove it. A good removal efficiency with a low substrate consumption has been found with H2-based processes especially N2H2.