THz Detection Using +/n-Well Diodes Fabricated in 45-nm CMOS
Electronic-detection up to [Formula Omitted] THz using +/n-well junction diodes in a 45-nm bulk CMOS process is demonstrated. Because the 1/f noise corner frequency is [Formula Omitted] kHz instead of [Formula Omitted] MHz common to Schottky and diode-connected nMOS transistor detectors, despite low...
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Veröffentlicht in: | IEEE electron device letters 2016-07, Vol.37 (7), p.823 |
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Hauptverfasser: | , |
Format: | Artikel |
Sprache: | eng |
Online-Zugang: | Volltext |
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Zusammenfassung: | Electronic-detection up to [Formula Omitted] THz using +/n-well junction diodes in a 45-nm bulk CMOS process is demonstrated. Because the 1/f noise corner frequency is [Formula Omitted] kHz instead of [Formula Omitted] MHz common to Schottky and diode-connected nMOS transistor detectors, despite lower responsivity, detectors using a +/n-well diode with an optimized transit time achieve competitive noise equivalent power (NEP) while exhibiting smaller variations. The junction diode has a measured zero-bias cutoff frequency ([Formula Omitted]) of [Formula Omitted] THz. The direct-antenna matched structure can reach a peak optical responsivity ([Formula Omitted]) of 558 V/W at 0.781 THz with a minimum optical NEP of 56 pW/Hz0.5 at a modulation frequency of 100 kHz. |
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ISSN: | 0741-3106 1558-0563 |
DOI: | 10.1109/LED.2016.2573268 |