ChemInform Abstract: Ta-Based Amorphous Metal Thin Films
Two new Ta‐based ternary metal thin films with approximate composition Ta2Ni2Si and Ta2Mo2Si are deposited by radiofrequency magnetron sputtering onto Si/SiO2 substrates.
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| Veröffentlicht in: | ChemInform 2015-11, Vol.46 (46), p.no-no |
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| creator | McGlone, John M. Olsen, Kristopher R. Stickle, William F. Abbott, James E. Pugliese, Roberto A. Long, Greg S. Keszler, Douglas A. Wager, John F. |
| description | Two new Ta‐based ternary metal thin films with approximate composition Ta2Ni2Si and Ta2Mo2Si are deposited by radiofrequency magnetron sputtering onto Si/SiO2 substrates. |
| doi_str_mv | 10.1002/chin.201546219 |
| format | Article |
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| language | eng |
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| source | Wiley Online Library All Journals |
| subjects | lasers molybdenum molybdenum, Mo nickel nickel, Ni semiconductors silicon silicon, Si Solar energy superconductors tantalum tantalum, Ta technology of materials technology of materials, lasers, semiconductors, superconductors Thin films |
| title | ChemInform Abstract: Ta-Based Amorphous Metal Thin Films |
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