ChemInform Abstract: Ta-Based Amorphous Metal Thin Films

ChemInform Abstract: Ta-Based Amorphous Metal Thin Films

Two new Ta‐based ternary metal thin films with approximate composition Ta2Ni2Si and Ta2Mo2Si are deposited by radiofrequency magnetron sputtering onto Si/SiO2 substrates.

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Bibliographische Detailangaben
Veröffentlicht in:ChemInform 2015-11, Vol.46 (46), p.no-no
Hauptverfasser: McGlone, John M., Olsen, Kristopher R., Stickle, William F., Abbott, James E., Pugliese, Roberto A., Long, Greg S., Keszler, Douglas A., Wager, John F.
Format: Artikel
Sprache:eng
Schlagworte:
lasers
molybdenum
molybdenum, Mo
nickel
nickel, Ni
semiconductors
silicon
silicon, Si
Solar energy
superconductors
tantalum
tantalum, Ta
technology of materials
technology of materials, lasers, semiconductors, superconductors
Thin films
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Beschreibung
Zusammenfassung:Two new Ta‐based ternary metal thin films with approximate composition Ta2Ni2Si and Ta2Mo2Si are deposited by radiofrequency magnetron sputtering onto Si/SiO2 substrates.
ISSN:0931-7597
1522-2667
DOI:10.1002/chin.201546219