BN-Enabled Epitaxy of Pb1-xSnxSe Nanoplates on SiO2/Si for High-Performance Mid-Infrared Detection

By designing a few‐layer boron nitried (BN) buffer layer, topological crystalline insulator Pb1–xSnxSe nanoplates are directly grown on SiO2/Si, which shows high compatibility with current Si‐based integrated circuit technology. Back‐gated field‐effect transistors of Pb1–xSnxSe nanoplates exhibit a...

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Veröffentlicht in:Small (Weinheim an der Bergstrasse, Germany) Germany), 2015-10, Vol.11 (40), p.5388-5394
Hauptverfasser: Wang, Qisheng, Wen, Yao, Yao, Fengrui, Huang, Yun, Wang, Zhenxing, Li, Molin, Zhan, Xueying, Xu, Kai, Wang, Fengmei, Wang, Feng, Li, Jie, Liu, Kaihui, Jiang, Chao, Liu, Fengqi, He, Jun
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container_issue 40
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container_title Small (Weinheim an der Bergstrasse, Germany)
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creator Wang, Qisheng
Wen, Yao
Yao, Fengrui
Huang, Yun
Wang, Zhenxing
Li, Molin
Zhan, Xueying
Xu, Kai
Wang, Fengmei
Wang, Feng
Li, Jie
Liu, Kaihui
Jiang, Chao
Liu, Fengqi
He, Jun
description By designing a few‐layer boron nitried (BN) buffer layer, topological crystalline insulator Pb1–xSnxSe nanoplates are directly grown on SiO2/Si, which shows high compatibility with current Si‐based integrated circuit technology. Back‐gated field‐effect transistors of Pb1–xSnxSe nanoplates exhibit a room‐temperature carrier mobility of 0.73–4.90 cm2 V−1 s−1, comparable to layered materials and molecular crystals, and high‐efficiency mid‐IR detection (1.9–2.0 μm).
doi_str_mv 10.1002/smll.201502049
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source Wiley Online Library Journals Frontfile Complete
subjects epitaxial growth
few-layer BN
functional substrates
mid-infrared detection
Nanotechnology
Pb1-xSnxSe nanoplates
title BN-Enabled Epitaxy of Pb1-xSnxSe Nanoplates on SiO2/Si for High-Performance Mid-Infrared Detection
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