Photopatterning of Cross-Linkable Epoxide-Functionalized Block Copolymers and Dual-Tone Nanostructure Development for Fabrication Across the Nano- and Microscales
The self‐assembly of block copolymers in thin films provides an attractive approach to patterning 5–100 nm structures. Cross‐linking and photopatterning of the self‐assembled block copolymer morphologies provide further opportunities to structure such materials for lithographic applications, and to...
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Veröffentlicht in: | Small (Weinheim an der Bergstrasse, Germany) Germany), 2015-05, Vol.11 (20), p.2407-2416 |
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description | The self‐assembly of block copolymers in thin films provides an attractive approach to patterning 5–100 nm structures. Cross‐linking and photopatterning of the self‐assembled block copolymer morphologies provide further opportunities to structure such materials for lithographic applications, and to also enhance the thermal, chemical, or mechanical stability of such nanostructures to achieve robust templates for subsequent fabrication processes. Here, model lamellar‐forming diblock copolymers of polystyrene and poly(methyl methacrylate) with an epoxide functionality are synthesized by atom transfer radical polymerization. We demonstrate that self‐assembly and cross‐linking of the reactive block copolymer materials in thin films can be decoupled into distinct, controlled process steps using solvent annealing and thermal treatment/ultraviolet exposure, respectively. Conventional optical lithography approaches can also be applied to the cross‐linkable block copolymer materials in thin films and enable simultaneous structure formation across scales—micrometer scale patterns achieved by photolithography and nanostructures via self‐assembly of the block copolymer. Such materials and processes are thus shown to be capable of self‐assembling distinct block copolymers (e.g., lamellae of significantly different periodicity) in adjacent regions of a continuous thin film.
An epoxide‐functionalized poly(styrene‐block‐methyl methacrylate) block copolymer system is shown to be capable of self‐assembling into nanostructures and subsequently cross‐linking in response to heat or light. Positive‐ and negative‐tone photopatterning using a dual‐tone nanostructure development process is achieved, enabling such materials to be applied for lithographic applications across multiple length scales. |
doi_str_mv | 10.1002/smll.201403364 |
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An epoxide‐functionalized poly(styrene‐block‐methyl methacrylate) block copolymer system is shown to be capable of self‐assembling into nanostructures and subsequently cross‐linking in response to heat or light. Positive‐ and negative‐tone photopatterning using a dual‐tone nanostructure development process is achieved, enabling such materials to be applied for lithographic applications across multiple length scales.</description><identifier>ISSN: 1613-6810</identifier><identifier>EISSN: 1613-6829</identifier><identifier>DOI: 10.1002/smll.201403364</identifier><identifier>PMID: 25611328</identifier><language>eng</language><publisher>Germany: Blackwell Publishing Ltd</publisher><subject>block copolymers ; Copolymers ; cross-linking ; hierarchical nanostructures ; Nanotechnology ; photolithography ; photopatterning ; self-assembly ; Thin films</subject><ispartof>Small (Weinheim an der Bergstrasse, Germany), 2015-05, Vol.11 (20), p.2407-2416</ispartof><rights>2015 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim</rights><rights>2015 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.</rights><rights>Copyright © 2015 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c5144-730c020e3c82512019b7b30b35220311ac1174f4d49cc379fd9aea041ad238fe3</citedby><cites>FETCH-LOGICAL-c5144-730c020e3c82512019b7b30b35220311ac1174f4d49cc379fd9aea041ad238fe3</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktopdf>$$Uhttps://onlinelibrary.wiley.com/doi/pdf/10.1002%2Fsmll.201403364$$EPDF$$P50$$Gwiley$$H</linktopdf><linktohtml>$$Uhttps://onlinelibrary.wiley.com/doi/full/10.1002%2Fsmll.201403364$$EHTML$$P50$$Gwiley$$H</linktohtml><link.rule.ids>314,776,780,1411,27901,27902,45550,45551</link.rule.ids><backlink>$$Uhttps://www.ncbi.nlm.nih.gov/pubmed/25611328$$D View this record in MEDLINE/PubMed$$Hfree_for_read</backlink></links><search><creatorcontrib>He, Chunlin</creatorcontrib><creatorcontrib>Stoykovich, Mark P.</creatorcontrib><title>Photopatterning of Cross-Linkable Epoxide-Functionalized Block Copolymers and Dual-Tone Nanostructure Development for Fabrication Across the Nano- and Microscales</title><title>Small (Weinheim an der Bergstrasse, Germany)</title><addtitle>Small</addtitle><description>The self‐assembly of block copolymers in thin films provides an attractive approach to patterning 5–100 nm structures. Cross‐linking and photopatterning of the self‐assembled block copolymer morphologies provide further opportunities to structure such materials for lithographic applications, and to also enhance the thermal, chemical, or mechanical stability of such nanostructures to achieve robust templates for subsequent fabrication processes. Here, model lamellar‐forming diblock copolymers of polystyrene and poly(methyl methacrylate) with an epoxide functionality are synthesized by atom transfer radical polymerization. We demonstrate that self‐assembly and cross‐linking of the reactive block copolymer materials in thin films can be decoupled into distinct, controlled process steps using solvent annealing and thermal treatment/ultraviolet exposure, respectively. Conventional optical lithography approaches can also be applied to the cross‐linkable block copolymer materials in thin films and enable simultaneous structure formation across scales—micrometer scale patterns achieved by photolithography and nanostructures via self‐assembly of the block copolymer. Such materials and processes are thus shown to be capable of self‐assembling distinct block copolymers (e.g., lamellae of significantly different periodicity) in adjacent regions of a continuous thin film.
An epoxide‐functionalized poly(styrene‐block‐methyl methacrylate) block copolymer system is shown to be capable of self‐assembling into nanostructures and subsequently cross‐linking in response to heat or light. Positive‐ and negative‐tone photopatterning using a dual‐tone nanostructure development process is achieved, enabling such materials to be applied for lithographic applications across multiple length scales.</description><subject>block copolymers</subject><subject>Copolymers</subject><subject>cross-linking</subject><subject>hierarchical nanostructures</subject><subject>Nanotechnology</subject><subject>photolithography</subject><subject>photopatterning</subject><subject>self-assembly</subject><subject>Thin films</subject><issn>1613-6810</issn><issn>1613-6829</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2015</creationdate><recordtype>article</recordtype><recordid>eNqFkUtv1DAUhSMEoqWwZYkssfbgR57LknZaRDpUmiIkNpbj3FB3nDjYDnT4OfxSkqaM2LHylXXOdx8nil5TsqKEsHe-M2bFCI0J52n8JDqmKeU4zVnx9FBTchS98P6OEE5ZnD2PjliSUspZfhz9vr61wQ4yBHC97r8h26LSWe9xpfudrA2g88He6wbweuxV0LaXRv-CBr03Vu1QaQdr9h04j2TfoLNRGnxje0Ab2Vsf3KjC6ACdwQ8wduigD6i1Dq1l7bSSMw6dqrkfCreLCT-ArvT8q6QB_zJ61krj4dXjexJ9Xp_flJe4-nTxoTytsEpoHOOME0UYAa5yltDpJEWd1ZzUPGFsWpxKRWkWt3ETF0rxrGibQoIkMZUN43kL_CR6u3AHZ7-P4IO4s6Ob1vWCTkcsWM7zbFKtFtXD1A5aMTjdSbcXlIg5EjFHIg6RTIY3j9ix7qA5yP9mMAmKRfBTG9j_Bye2V1X1LxwvXu0D3B-80u1EmvEsEV82F-Lr5uP15bZkYsv_AB0wqg4</recordid><startdate>201505</startdate><enddate>201505</enddate><creator>He, Chunlin</creator><creator>Stoykovich, Mark P.</creator><general>Blackwell Publishing Ltd</general><general>Wiley Subscription Services, Inc</general><scope>BSCLL</scope><scope>NPM</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7SR</scope><scope>7U5</scope><scope>8BQ</scope><scope>8FD</scope><scope>JG9</scope><scope>L7M</scope></search><sort><creationdate>201505</creationdate><title>Photopatterning of Cross-Linkable Epoxide-Functionalized Block Copolymers and Dual-Tone Nanostructure Development for Fabrication Across the Nano- and Microscales</title><author>He, Chunlin ; Stoykovich, Mark P.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c5144-730c020e3c82512019b7b30b35220311ac1174f4d49cc379fd9aea041ad238fe3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2015</creationdate><topic>block copolymers</topic><topic>Copolymers</topic><topic>cross-linking</topic><topic>hierarchical nanostructures</topic><topic>Nanotechnology</topic><topic>photolithography</topic><topic>photopatterning</topic><topic>self-assembly</topic><topic>Thin films</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>He, Chunlin</creatorcontrib><creatorcontrib>Stoykovich, Mark P.</creatorcontrib><collection>Istex</collection><collection>PubMed</collection><collection>CrossRef</collection><collection>Engineered Materials Abstracts</collection><collection>Solid State and Superconductivity Abstracts</collection><collection>METADEX</collection><collection>Technology Research Database</collection><collection>Materials Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>Small (Weinheim an der Bergstrasse, Germany)</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>He, Chunlin</au><au>Stoykovich, Mark P.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Photopatterning of Cross-Linkable Epoxide-Functionalized Block Copolymers and Dual-Tone Nanostructure Development for Fabrication Across the Nano- and Microscales</atitle><jtitle>Small (Weinheim an der Bergstrasse, Germany)</jtitle><addtitle>Small</addtitle><date>2015-05</date><risdate>2015</risdate><volume>11</volume><issue>20</issue><spage>2407</spage><epage>2416</epage><pages>2407-2416</pages><issn>1613-6810</issn><eissn>1613-6829</eissn><abstract>The self‐assembly of block copolymers in thin films provides an attractive approach to patterning 5–100 nm structures. Cross‐linking and photopatterning of the self‐assembled block copolymer morphologies provide further opportunities to structure such materials for lithographic applications, and to also enhance the thermal, chemical, or mechanical stability of such nanostructures to achieve robust templates for subsequent fabrication processes. Here, model lamellar‐forming diblock copolymers of polystyrene and poly(methyl methacrylate) with an epoxide functionality are synthesized by atom transfer radical polymerization. We demonstrate that self‐assembly and cross‐linking of the reactive block copolymer materials in thin films can be decoupled into distinct, controlled process steps using solvent annealing and thermal treatment/ultraviolet exposure, respectively. Conventional optical lithography approaches can also be applied to the cross‐linkable block copolymer materials in thin films and enable simultaneous structure formation across scales—micrometer scale patterns achieved by photolithography and nanostructures via self‐assembly of the block copolymer. Such materials and processes are thus shown to be capable of self‐assembling distinct block copolymers (e.g., lamellae of significantly different periodicity) in adjacent regions of a continuous thin film.
An epoxide‐functionalized poly(styrene‐block‐methyl methacrylate) block copolymer system is shown to be capable of self‐assembling into nanostructures and subsequently cross‐linking in response to heat or light. Positive‐ and negative‐tone photopatterning using a dual‐tone nanostructure development process is achieved, enabling such materials to be applied for lithographic applications across multiple length scales.</abstract><cop>Germany</cop><pub>Blackwell Publishing Ltd</pub><pmid>25611328</pmid><doi>10.1002/smll.201403364</doi><tpages>10</tpages></addata></record> |
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subjects | block copolymers Copolymers cross-linking hierarchical nanostructures Nanotechnology photolithography photopatterning self-assembly Thin films |
title | Photopatterning of Cross-Linkable Epoxide-Functionalized Block Copolymers and Dual-Tone Nanostructure Development for Fabrication Across the Nano- and Microscales |
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