The Photopolymer Science and Technology Award
The Photopolymer Science and Technology Award No. 142100, the Best Paper Award 2014, was presented to Kato, Hirokazu, Seino, Yuriko, Yonemitsu, Hiroki, Sato, Hironobu, Kanno, Masahiro, Kobayashi, Katsutoshi, Kawanishi, Ayako, Imamura, Tsubasa, Omura, Mitsuhiro, Nakamura, Naofumi, Azuma, Tsukasa (Tos...
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| Veröffentlicht in: | Journal of Photopolymer Science and Technology 2014/07/08, Vol.27(1), pp.7-10 |
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| container_end_page | 10 |
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| container_title | Journal of Photopolymer Science and Technology |
| container_volume | 27 |
| creator | Kato, Hirokazu Seino, Yuriko Yonemitsu, Hiroki Sato, Hironobu Kanno, Masahiro Kobayashi, Katsutoshi Kawanishi, Ayako Imamura, Tsubasa Omura, Mitsuhiro Nakamura, Naofumi Azuma, Tsukasa |
| description | The Photopolymer Science and Technology Award No. 142100, the Best Paper Award 2014, was presented to Kato, Hirokazu, Seino, Yuriko, Yonemitsu, Hiroki, Sato, Hironobu, Kanno, Masahiro, Kobayashi, Katsutoshi, Kawanishi, Ayako, Imamura, Tsubasa, Omura, Mitsuhiro, Nakamura, Naofumi, Azuma, Tsukasa (Toshiba Corporation) for their outstanding contribution published in the Journal of Photopolymer Science and Technology, 26, (2013) 21-26, entitled “Electrical Via Chain Yield for DSA Contact Hole Shrink Process”. |
| doi_str_mv | 10.2494/photopolymer.27.7 |
| format | Article |
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| fulltext | fulltext |
| identifier | ISSN: 0914-9244 |
| ispartof | Journal of Photopolymer Science and Technology, 2014/07/08, Vol.27(1), pp.7-10 |
| issn | 0914-9244 1349-6336 |
| language | eng |
| recordid | cdi_proquest_journals_1551904747 |
| source | Elektronische Zeitschriftenbibliothek - Frei zugängliche E-Journals; J-STAGE (Japan Science & Technology Information Aggregator, Electronic) Freely Available Titles - Japanese; Free Full-Text Journals in Chemistry |
| subjects | 193 nm lithography DSA PST Award |
| title | The Photopolymer Science and Technology Award |
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