The Photopolymer Science and Technology Award

The Photopolymer Science and Technology Award No. 142100, the Best Paper Award 2014, was presented to Kato, Hirokazu, Seino, Yuriko, Yonemitsu, Hiroki, Sato, Hironobu, Kanno, Masahiro, Kobayashi, Katsutoshi, Kawanishi, Ayako, Imamura, Tsubasa, Omura, Mitsuhiro, Nakamura, Naofumi, Azuma, Tsukasa (Tos...

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Veröffentlicht in:	Journal of Photopolymer Science and Technology 2014/07/08, Vol.27(1), pp.7-10
Hauptverfasser:	Kato, Hirokazu, Seino, Yuriko, Yonemitsu, Hiroki, Sato, Hironobu, Kanno, Masahiro, Kobayashi, Katsutoshi, Kawanishi, Ayako, Imamura, Tsubasa, Omura, Mitsuhiro, Nakamura, Naofumi, Azuma, Tsukasa
Format:	Artikel
Sprache:	eng
Schlagworte:	193 nm lithography DSA PST Award
Online-Zugang:	Volltext
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Beschreibung
Zusammenfassung:	The Photopolymer Science and Technology Award No. 142100, the Best Paper Award 2014, was presented to Kato, Hirokazu, Seino, Yuriko, Yonemitsu, Hiroki, Sato, Hironobu, Kanno, Masahiro, Kobayashi, Katsutoshi, Kawanishi, Ayako, Imamura, Tsubasa, Omura, Mitsuhiro, Nakamura, Naofumi, Azuma, Tsukasa (Toshiba Corporation) for their outstanding contribution published in the Journal of Photopolymer Science and Technology, 26, (2013) 21-26, entitled “Electrical Via Chain Yield for DSA Contact Hole Shrink Process”.
ISSN:	0914-9244 1349-6336
DOI:	10.2494/photopolymer.27.7