Deposition of Cu and Al nanosized films in a vacuum by a laser method

Deposition of Cu and Al nanosized films in a vacuum by a laser method

Copper and aluminum nanosized films have been obtained. The films were deposited on substrates in a vacuum by a laser-plasma method. The structure of the film surfaces has been determined depending on the power density of the laser radiation acting on metal targets. The thresholds of evaporation for...

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Veröffentlicht in:Journal of engineering physics and thermophysics 2013-09, Vol.86 (5), p.1020-1026
Hauptverfasser: Goncharov, V. K., Gusakov, G. A., Puzyrev, M. V.
Format: Artikel
Sprache:eng
Schlagworte:
Classical Mechanics
Coatings
Coatings industry
Complex Systems
Dielectric films
Engineering
Engineering Thermodynamics
Heat and Mass Transfer
Industrial Chemistry/Chemical Engineering
Metallic films
Methods
Nuclear radiation
Thermodynamics
Thin films
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Zusammenfassung:Copper and aluminum nanosized films have been obtained. The films were deposited on substrates in a vacuum by a laser-plasma method. The structure of the film surfaces has been determined depending on the power density of the laser radiation acting on metal targets. The thresholds of evaporation for aluminum and copper under the action of a nanosecond laser pulse have been found.
ISSN:1062-0125
1573-871X
DOI:10.1007/s10891-013-0923-y