Fabrication of Low Dislocation Density GaN Template by Nano-channel FIELO Using Nanoimprint Lithography

Fabrication of Low Dislocation Density GaN Template by Nano-channel FIELO Using Nanoimprint Lithography

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Veröffentlicht in:Journal of Photopolymer Science and Technology 2013/06/25, Vol.26(1), pp.69-72
Hauptverfasser: Okada, Akiko, Shoji, Shuichi, Shinohara, Hidetoshi, Goto, Hiroshi, Sunakawa, Haruo, Matsueda, Toshiharu, Usui, Akira, Yamaguchi, Atsushi A., Mizuno, Jun
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dry etching
hydride vapor phase epitaxy
light-emitting diode
nanoimprint lithography
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container_title Journal of Photopolymer Science and Technology
container_volume 26
creator Okada, Akiko
Shoji, Shuichi
Shinohara, Hidetoshi
Goto, Hiroshi
Sunakawa, Haruo
Matsueda, Toshiharu
Usui, Akira
Yamaguchi, Atsushi A.
Mizuno, Jun
description
doi_str_mv 10.2494/photopolymer.26.69
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source J-STAGE (Japan Science & Technology Information Aggregator, Electronic) Freely Available Titles - Japanese; EZB-FREE-00999 freely available EZB journals; Free Full-Text Journals in Chemistry
subjects dry etching
hydride vapor phase epitaxy
light-emitting diode
nanoimprint lithography
title Fabrication of Low Dislocation Density GaN Template by Nano-channel FIELO Using Nanoimprint Lithography
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