Evaluation of Template Releasing Energy in Nanoimprint Lithography
To investigate template releasing process in nanoimprint lithography, template releasing energy from resist polymer is evaluated under various conditions using test rig. The template releasing energy is proportional to the surface energy of the template, however it does not depend on rigidness of th...
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Veröffentlicht in: | Journal of Photopolymer Science and Technology 2013/06/25, Vol.26(1), pp.137-141 |
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Hauptverfasser: | , , , |
Format: | Artikel |
Sprache: | eng |
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Online-Zugang: | Volltext |
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Zusammenfassung: | To investigate template releasing process in nanoimprint lithography, template releasing energy from resist polymer is evaluated under various conditions using test rig. The template releasing energy is proportional to the surface energy of the template, however it does not depend on rigidness of the system and template lifting speed. |
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ISSN: | 0914-9244 1349-6336 |
DOI: | 10.2494/photopolymer.26.137 |