Comparison of Resist Family Outgassing Characterization between EUV and EB
Witness-sample (WS) testing is the most favorable method for the simulation of EUV optics contamination by resist outgassing. Resists are expected to be correctly qualified with this method before they are used in HVM exposure tools. However, the present capacity of outgassing test facilities is ins...
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| Veröffentlicht in: | Journal of Photopolymer Science and Technology 2013/06/25, Vol.26(5), pp.673-678 |
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| container_title | Journal of Photopolymer Science and Technology |
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| creator | Takagi, Isamu Takahashi, Toshiya Sugie, Norihiko Katayama, Kazuhiro Kikuchi, Yukiko Shiobara, Eishi Tanaka, Hiroyuki Inoue, Soichi Watanabe, Takeo Harada, Tetsuo Kinoshita, Hiroo |
| description | Witness-sample (WS) testing is the most favorable method for the simulation of EUV optics contamination by resist outgassing. Resists are expected to be correctly qualified with this method before they are used in HVM exposure tools. However, the present capacity of outgassing test facilities is insufficient for the total anticipated needs, based on the current capacity of existing EUV exposure tools. This paper defines a resist family for reducing the total number of required outgassing tests. The material contributions to outgassing are discussed on the basis of results obtained with model resists, where two types of WS test systems?high-power EUV light and EB sources?are used. A correlation between these light sources is also discussed. |
| doi_str_mv | 10.2494/photopolymer.26.673 |
| format | Article |
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Resists are expected to be correctly qualified with this method before they are used in HVM exposure tools. However, the present capacity of outgassing test facilities is insufficient for the total anticipated needs, based on the current capacity of existing EUV exposure tools. This paper defines a resist family for reducing the total number of required outgassing tests. The material contributions to outgassing are discussed on the basis of results obtained with model resists, where two types of WS test systems?high-power EUV light and EB sources?are used. 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Photopol. Sci. Technol.</addtitle><description>Witness-sample (WS) testing is the most favorable method for the simulation of EUV optics contamination by resist outgassing. Resists are expected to be correctly qualified with this method before they are used in HVM exposure tools. However, the present capacity of outgassing test facilities is insufficient for the total anticipated needs, based on the current capacity of existing EUV exposure tools. This paper defines a resist family for reducing the total number of required outgassing tests. The material contributions to outgassing are discussed on the basis of results obtained with model resists, where two types of WS test systems?high-power EUV light and EB sources?are used. A correlation between these light sources is also discussed.</description><subject>contamination</subject><subject>EUV</subject><subject>outgassing</subject><subject>resist family</subject><subject>witness sample</subject><issn>0914-9244</issn><issn>1349-6336</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2013</creationdate><recordtype>article</recordtype><recordid>eNplkF1LwzAUhoMoOKe_wJuA151J89HmUsfmB4OBOG9DmqZbRtvUJEPmrzeyMQSvzrl4n3N4HwBuMZrkVND7YeOiG1y774yf5HzCC3IGRphQkXFC-DkYIYFpJnJKL8FVCFuECGFMjMDr1HWD8ja4HroGvplgQ4Rz1dl2D5e7uFYh2H4NpxvllY7G228VbQpXJn4Z08PZ6gOqvoazx2tw0ag2mJvjHIPVfPY-fc4Wy6eX6cMi04ywmJGiNGlDNTGK4bLgrMCoEnmja1FWmKVCui4YZlWOddkgZThXRGBOOW5SIzIGd4e7g3efOxOi3Lqd79NLiWlRCMFLzlOKHFLauxC8aeTgbaf8XmIkf6XJv9JkzmWSlqj5gdqGqNbmxCgfrW7NP4YdwVNAJ0_S9OQHaUl9VQ</recordid><startdate>20130101</startdate><enddate>20130101</enddate><creator>Takagi, Isamu</creator><creator>Takahashi, Toshiya</creator><creator>Sugie, Norihiko</creator><creator>Katayama, Kazuhiro</creator><creator>Kikuchi, Yukiko</creator><creator>Shiobara, Eishi</creator><creator>Tanaka, Hiroyuki</creator><creator>Inoue, Soichi</creator><creator>Watanabe, Takeo</creator><creator>Harada, Tetsuo</creator><creator>Kinoshita, Hiroo</creator><general>The Society of Photopolymer Science and Technology(SPST)</general><general>Japan Science and Technology Agency</general><scope>AAYXX</scope><scope>CITATION</scope><scope>7SP</scope><scope>7SR</scope><scope>7U5</scope><scope>8FD</scope><scope>JG9</scope><scope>L7M</scope></search><sort><creationdate>20130101</creationdate><title>Comparison of Resist Family Outgassing Characterization between EUV and EB</title><author>Takagi, Isamu ; Takahashi, Toshiya ; Sugie, Norihiko ; Katayama, Kazuhiro ; Kikuchi, Yukiko ; Shiobara, Eishi ; Tanaka, Hiroyuki ; Inoue, Soichi ; Watanabe, Takeo ; Harada, Tetsuo ; Kinoshita, Hiroo</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c535t-378ec530d3ea518765710b92fcd98b15249cd7515b21c8f0ae66a3916461f3493</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2013</creationdate><topic>contamination</topic><topic>EUV</topic><topic>outgassing</topic><topic>resist family</topic><topic>witness sample</topic><toplevel>online_resources</toplevel><creatorcontrib>Takagi, Isamu</creatorcontrib><creatorcontrib>Takahashi, Toshiya</creatorcontrib><creatorcontrib>Sugie, Norihiko</creatorcontrib><creatorcontrib>Katayama, Kazuhiro</creatorcontrib><creatorcontrib>Kikuchi, Yukiko</creatorcontrib><creatorcontrib>Shiobara, Eishi</creatorcontrib><creatorcontrib>Tanaka, Hiroyuki</creatorcontrib><creatorcontrib>Inoue, Soichi</creatorcontrib><creatorcontrib>Watanabe, Takeo</creatorcontrib><creatorcontrib>Harada, Tetsuo</creatorcontrib><creatorcontrib>Kinoshita, Hiroo</creatorcontrib><collection>CrossRef</collection><collection>Electronics & Communications Abstracts</collection><collection>Engineered Materials Abstracts</collection><collection>Solid State and Superconductivity Abstracts</collection><collection>Technology Research Database</collection><collection>Materials Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>Journal of Photopolymer Science and Technology</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Takagi, Isamu</au><au>Takahashi, Toshiya</au><au>Sugie, Norihiko</au><au>Katayama, Kazuhiro</au><au>Kikuchi, Yukiko</au><au>Shiobara, Eishi</au><au>Tanaka, Hiroyuki</au><au>Inoue, Soichi</au><au>Watanabe, Takeo</au><au>Harada, Tetsuo</au><au>Kinoshita, Hiroo</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Comparison of Resist Family Outgassing Characterization between EUV and EB</atitle><jtitle>Journal of Photopolymer Science and Technology</jtitle><addtitle>J. Photopol. Sci. Technol.</addtitle><date>2013-01-01</date><risdate>2013</risdate><volume>26</volume><issue>5</issue><spage>673</spage><epage>678</epage><pages>673-678</pages><issn>0914-9244</issn><eissn>1349-6336</eissn><abstract>Witness-sample (WS) testing is the most favorable method for the simulation of EUV optics contamination by resist outgassing. Resists are expected to be correctly qualified with this method before they are used in HVM exposure tools. However, the present capacity of outgassing test facilities is insufficient for the total anticipated needs, based on the current capacity of existing EUV exposure tools. This paper defines a resist family for reducing the total number of required outgassing tests. The material contributions to outgassing are discussed on the basis of results obtained with model resists, where two types of WS test systems?high-power EUV light and EB sources?are used. A correlation between these light sources is also discussed.</abstract><cop>Hiratsuka</cop><pub>The Society of Photopolymer Science and Technology(SPST)</pub><doi>10.2494/photopolymer.26.673</doi><tpages>6</tpages><oa>free_for_read</oa></addata></record> |
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| language | eng |
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| subjects | contamination EUV outgassing resist family witness sample |
| title | Comparison of Resist Family Outgassing Characterization between EUV and EB |
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