Comparison of Resist Family Outgassing Characterization between EUV and EB

Witness-sample (WS) testing is the most favorable method for the simulation of EUV optics contamination by resist outgassing. Resists are expected to be correctly qualified with this method before they are used in HVM exposure tools. However, the present capacity of outgassing test facilities is insufficient for the total anticipated needs, based on the current capacity of existing EUV exposure tools. This paper defines a resist family for reducing the total number of required outgassing tests. The material contributions to outgassing are discussed on the basis of results obtained with model resists, where two types of WS test systems?high-power EUV light and EB sources?are used. A correlation between these light sources is also discussed.