Narrow-Linewidth KrF Excimer Laser Using a Self-Amplification Resonator
A narrow linewidth excimer laser for photo-micro-lithography has been investigated . To satisfy the need for both high power and long lifetime of narrowing optics, we developed an original self-amplificaton resonator with two etalons and a prism.An out putpower of 8 watts with a spectralinewidth of...
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Veröffentlicht in: | Rēzā kenkyū 1995/05/29, Vol.23(5), pp.347-354 |
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Hauptverfasser: | , , |
Format: | Artikel |
Sprache: | eng |
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Online-Zugang: | Volltext |
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Zusammenfassung: | A narrow linewidth excimer laser for photo-micro-lithography has been investigated . To satisfy the need for both high power and long lifetime of narrowing optics, we developed an original self-amplificaton resonator with two etalons and a prism.An out putpower of 8 watts with a spectralinewidth of 1.0pm can be obtained at a pulse repetition rate of 600pps by using the resonator we developed.An estimated intracavity laser power intensity through the etalonsis1/10and output power is twice that with a conventional narrowlinewidth resonator. |
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ISSN: | 0387-0200 1349-6603 |
DOI: | 10.2184/lsj.23.347 |