Patterned Deposition of PS Gel is Controlled by Chitosan or Acetic Acid Additives

Patterned Deposition of PS Gel is Controlled by Chitosan or Acetic Acid Additives

Phase-separation of polymers in thin films produces a wide variety of patterns. Here we show that a polystyrene/poly(methylmethacrylate solution can form stable phase separated structures when an additive such as chitosan or acetic acid is used. The phase separated films were analyzed by fluorescenc...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:E-journal of surface science and nanotechnology 2011/11/09, Vol.9, pp.404-408
Hauptverfasser: Kiyono, Yuji, Karthaus, Olaf
Format: Artikel
Sprache:eng
Schlagworte:
Etching
Nano structure chemistry
Phase separation
Polymer
Processing and fabrication
Silicon
Surface roughness
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:Phase-separation of polymers in thin films produces a wide variety of patterns. Here we show that a polystyrene/poly(methylmethacrylate solution can form stable phase separated structures when an additive such as chitosan or acetic acid is used. The phase separated films were analyzed by fluorescence microscopy. Possible applications of these films are as etching masks for solar cells or for security systems. [DOI: 10.1380/ejssnt.2011.404]
ISSN:1348-0391
1348-0391
DOI:10.1380/ejssnt.2011.404