Self-assembled Multilayer Formed by Alternate Stacking of Zirconium and Terephthalic Acid Layers

Self-assembled Multilayer Formed by Alternate Stacking of Zirconium and Terephthalic Acid Layers

A self-assembled multilayer consisting of transition metal and biscarboxyl acid was fabricated by simply immersing an oxide-covered silicon substrate into zirconium (Zr) n-butoxide and terephthalic acid (TPA) solutions alternately. In this multilayer, two TPA monolayers were bridged with a ZrIV mono...

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Veröffentlicht in:Chemistry letters 2006-12, Vol.35 (12), p.1392-1393
Hauptverfasser: Yonezawa, Hiroyuki, Lee, Kyung-Hwang, Murase, Kuniaki, Sugimura, Hiroyuki
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container_end_page 1393
container_issue 12
container_start_page 1392
container_title Chemistry letters
container_volume 35
creator Yonezawa, Hiroyuki
Lee, Kyung-Hwang
Murase, Kuniaki
Sugimura, Hiroyuki
description A self-assembled multilayer consisting of transition metal and biscarboxyl acid was fabricated by simply immersing an oxide-covered silicon substrate into zirconium (Zr) n-butoxide and terephthalic acid (TPA) solutions alternately. In this multilayer, two TPA monolayers were bridged with a ZrIV monolayer. The chemistry connecting these monolayers is most likely coordinate bonds between ZrIV ions and carboxyl groups.
doi_str_mv 10.1246/cl.2006.1392
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title Self-assembled Multilayer Formed by Alternate Stacking of Zirconium and Terephthalic Acid Layers
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