Self-assembled Multilayer Formed by Alternate Stacking of Zirconium and Terephthalic Acid Layers

A self-assembled multilayer consisting of transition metal and biscarboxyl acid was fabricated by simply immersing an oxide-covered silicon substrate into zirconium (Zr) n-butoxide and terephthalic acid (TPA) solutions alternately. In this multilayer, two TPA monolayers were bridged with a ZrIV monolayer. The chemistry connecting these monolayers is most likely coordinate bonds between ZrIV ions and carboxyl groups.