Site-selective Coating of Polymer Thin Film Prepared by the Ink-jet Method on the Patterned Fluoroalkylsilane Monolayer Substrate

The purpose of this study is to establish the fundamental technology of site-selective coating of polymer thin film utilizing wetting contrast of patterned fluoroalkylsilane monolayer/silanol (Si–OH) surfaces. Polystyrene (PS)/xylene solution was coated on the patterned surface with wetting contrast by ink-jet method. The patterned PS ultrathin films were selectively formed on lyophilic Si–OH areas.