Characterization of Atomically Smooth Al Films by Transmission Electron Microscopy and Atomic Force Microscopy
Atomically smooth Al films were prepared by vacuum evaporation on heated mica substrates at 350°C. The films consist of single crystals 270 nm in diameter with (111) faces and the crystals are oriented randomly about the [111] direction which is perpendicular to the substrate. The roughness of the A...
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| Veröffentlicht in: | Chemistry letters 1997-08, Vol.26 (8), p.709-710 |
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| Hauptverfasser: | , , , |
| Format: | Artikel |
| Sprache: | eng |
| Online-Zugang: | Volltext |
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| Zusammenfassung: | Atomically smooth Al films were prepared by vacuum evaporation on heated mica substrates at 350°C. The films consist of single crystals 270 nm in diameter with (111) faces and the crystals are oriented randomly about the [111] direction which is perpendicular to the substrate. The roughness of the Al film surfaces is 0.6 nm over 1 × 1 μm areas. |
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| ISSN: | 0366-7022 1348-0715 |
| DOI: | 10.1246/cl.1997.709 |