Lithography Based on Molecular Glasses

Lithography Based on Molecular Glasses

Several novel classes of molecular glasses were synthesized as photoresist materials for next generation lithography. These compounds were protected by protecting groups for chemically amplified systems and proved to possess high glass transition temperature (Tg) as well as amorphous properties. A p...

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Veröffentlicht in:Journal of Photopolymer Science and Technology 2005, Vol.18(3), pp.431-434
Hauptverfasser: Tsuchiya, Kousuke, Chang, Seung Wook, Felix, Nelson M., Ueda, Mitsuru, Ober, Christopher K.
Format: Artikel
Sprache:eng
Schlagworte:
E-beam lithography
hexa(hydroxyphenyl)benzene
line edge roughness
molecular glasses
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Zusammenfassung:Several novel classes of molecular glasses were synthesized as photoresist materials for next generation lithography. These compounds were protected by protecting groups for chemically amplified systems and proved to possess high glass transition temperature (Tg) as well as amorphous properties. A positive-tone photoresist system with hexa(t-butoxy- carbonyloxyphenyl)benzene was demonstrated using E-beam lithography and 200 nm pattern size was obtained.
ISSN:0914-9244
1349-6336
DOI:10.2494/photopolymer.18.431